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Advanced Lithography
21. Februar
- 25. Februar
San Jose, CA, USA

Besuchen Sie unsere Poster Session:

Optical Microlithography XXIII - FreeForm and SMO:
Datum: Mittwoch, d. 24. Februar 2010
Zeit: 18:00 - 20:00

Paper 7640-74: "Novel continuously shaped diffractive optical elements enable high-efficiency beam shaping"

Autoren: Yuri V. Miklyaev, Waleri Imgrunt, LIMO (Germany); Vladimir S. Pavelyev, Image Processing Systems Institute (Russian Federation); D. G. Kachalov, Samara State Aerospace Univ. (Russian Federation); Tanja Bizjak, Lutz Aschke, Vitalij N. Lissotschenko, LIMO (Germany)

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